اچینگ پلاسما: مقدمه‌ای بر تعاملات مواد

Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods. Content: Plasma–Materials Interactions , Page ii Front Matter , Page iii Copyright , Page iv Contributors , Page ix Preface , Pages xi-xii , Dennis M. Manos, Daniel L. Flamm 1 - Plasma Etching Technology—An Overview , Pages 1-89 , Daniel L. Flamma, G. Kenneth Herb 2 - Introduction to Plasma Chemistry , Pages 91-183 , Daniel L. Flamm 3 - An Introduction to Plasma Physics for Materials Processing , Pages 185-258 , Samuel A. Cohen 4 - Diagnostics of Plasmas for Materials Processing , Pages 259-337 , D.M. Manos, H.F. Dylla 5 - Plasma Etch Equipment and Technology , Pages 339-389 , Alan R. Reinberg 6 - Ion Beam Etching , Pages 391-423 , James M.E. Harper 7 - Safety, Health, and Engineering Considerations for Plasma Processing , Pages 425-470 , G.K. Herb Index , Pages 471-476 Plasma–Materials Interactions , Page 477 The rapid development of plasma etching technology was stimulated by its application to the manufacture of microelectronic devices.